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A method for producing a single crystal of SiC 发明授权

2023-07-31 2030 242K 0

专利信息

申请日期 2025-06-24 申请号 JP2010265805
公开(公告)号 JP5189156B2 公开(公告)日 2013-04-24
公开国别 JP 申请人省市代码 全国
申请人 Institute Inc3609; Denso Corporation4260; TOYOTA MOTOR CORP
简介 A manufacturing method of a SiC single crystal includes a first growth process and a re-growth process. In the first growth process, a first seed crystal made of SiC is used to grow a first SiC single crystal. In the re-growth process, a plurality of growth steps is performed for (n−1) times. In a k-th growth step, a k-th seed crystal is cut out from a grown (k−1)-th SiC single crystal, and the k-th seed crystal is used to grow a k-th SiC single crystal (n≧2 and 2≰k≰n). When an offset angle of a growth surface of the k-th seed crystal is defined as θk, at least in one of the plurality of growth steps, the offset angle θk is smaller than the offset angle θk−1.


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