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Plasma discharge device 发明授权

2023-02-24 2320 185K 0

专利信息

申请日期 2025-06-27 申请号 JP2008207736
公开(公告)号 JP5157741B2 公开(公告)日 2013-03-06
公开国别 JP 申请人省市代码 全国
申请人 Konica Minolta Holdings Inc1270
简介 PROBLEM TO BE SOLVED : To provide a plasma-discharge treatment apparatus which continuously allows a uniform reforming treatment of the surfaces of wide base materials. SOLUTION : The plasma-discharge treatment apparatus includes a first electrode and a second electrode provided oppositely and treats the surface of a base material by allowing the base material to pass through a discharge part formed between the first and second electrodes. Further, the plasma-discharge treatment apparatus includes a power supply member arranged in no contact with the first electrode and an earth member arranged in no contact with the second electrode, wherein the first electrode is configured so as to be movable with respect to the power supply member and the second electrode is configured so as to be movable with respect to the earth member. COPYRIGHT : (C)2010, JPO&INPIT


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