| 申请日期 | 2025-08-16 | 申请号 | US11962942 |
| 公开（公告）号 | US8367200B2 | 公开（公告）日 | 2013-02-05 |
| 公开国别 | US | 申请人省市代码 | 全国 |
| 申请人 | Toshiki Sato; Jun Suzuki; Shinichi Tanifuji; Takayuki Tsubota; Yoshinori Ito | ||
| 简介 | A reflecting film including : an Ag or Ag-base alloy thin film of an Ag-base alloy containing at least one element among Au, Pt, Pd, Bi, and rare-earth elements as a first layer; a film of an oxide or oxynitride of at least one element among Si, Al and Ti having a thickness between 5 and 50 nm as a second layer deposited on the first layer; and a film having a thickness between 10 and 100 nm formed by a plasma polymerization process as a third layer deposited on the second layer. | ||
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