客服热线:18202992950

Yttrium oxide material and member for semiconductor manufacturing equipment 发明授权

2023-02-26 4620 100K 0

专利信息

申请日期 2025-07-18 申请号 JP2008064341
公开(公告)号 JP5117892B2 公开(公告)日 2013-01-16
公开国别 JP 申请人省市代码 全国
申请人 NGK Insulators Ltd4064
简介 PROBLEM TO BE SOLVED : To improve workability of a yttrium oxide material, and further, to improve its wear resistance. SOLUTION : An electrostatic chuck 20 is composed of a yttrium oxide material in which, provided that fracture toughness is defined as KIC(MPa m1/2) and Vickers hardness in the weighting of 9.8 N is defined as Hv (GPa), Vickers hardness Hv is ≥10 GPa, and KIC/Hv lies in the preferable range of ≥0.15. Provided that the yttrium oxide is defined as a first phase as a base material, a second phase other than the first phase is preferably comprised by 5 to 20 vol.%. The second phase can be a compound showing a Vickers hardness Hv of ≥12 GPa in the weighting of 9.8 N, e.g., a nitride or a carbide. Alternatively, the second phase can be an oxide in which a solid solution limit is present in ≥5 mol% to yttrium oxide or a compound between the oxide and yttrium oxide, e.g., a rare earth oxide. COPYRIGHT : (C)2010, JPO&INPIT


您还没有登录,请登录后查看下载地址


反对 0举报 0 收藏 0 打赏 0评论 0
下载排行
网站首页  |  关于我们  |  联系方式  |  使用协议  |  版权隐私  |  网站地图  |  排名推广  |  广告服务  |  积分换礼  |  网站留言  |  RSS订阅  |  违规举报  |  京ICP备2021025988号-4