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METHOD FOR PRODUCING NITRIDE CRYSTAL AND NITRIDE CRYSTAL 发明申请

2023-07-09 3820 217K 0

专利信息

申请日期 2026-04-23 申请号 JP2012141264
公开(公告)号 JP2013006762A 公开(公告)日 2013-01-10
公开国别 JP 申请人省市代码 全国
申请人 TOHOKU UNIV; JAPAN STEEL WORKS LTD : THE; MITSUBISHI CHEMICALS CORP
简介 PROBLEM TO BE SOLVED : To provide a method for producing a nitride semiconductor crystal having low impurity concentration such as oxygen at a high growth rate. SOLUTION : A zinc halide is used as a mineralizer when growth of the nitride semiconductor crystal 2 is performed in the presence of a solvent 3 in a supercritical state and/or in a subcritical state in a reaction vessel. A compound containing a halogen atom, an alkali metal, an alkaline earth metal or a rare earth metal, which is a compound other than the zinc halide, may be used together. The reaction vessel is a capsule composed of a platinum group or alloy containing the platinum group. COPYRIGHT : (C)2013, JPO&INPIT


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