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METHOD FOR PURIFYING SILICON 发明申请

2023-08-17 4720 47K 0

专利信息

申请日期 2025-08-06 申请号 JP2011128098
公开(公告)号 JP2012254894A 公开(公告)日 2012-12-27
公开国别 JP 申请人省市代码 全国
申请人 SHIN ETSU CHEMICAL CO LTD
简介 PROBLEM TO BE SOLVED : To remove P in silicon more inexpensively and efficiently than conventional methods. SOLUTION : There is provided a method for purifying silicon in which P contained in silicon is removed by carrying out a first process of heating and melting the silicon containing P as an impurity and slag, subsequently bringing the silicon into contact with the slag in the molten state to make the slag absorb the P in the silicon, cooling and solidifying them, and separating and removing the slag having absorbed the P from the silicon at least once, and then carrying out a second process of shredding and treating the obtained silicon with a solution containing inorganic acid. The composition of the slag includes at least one kind of basic oxide, and the slag comprises the basic oxide and a mixture selected out of a neutral oxide, an acidic oxide, an alkali metal halide, and an alkali earth metal halide, the content of the acidic oxide being smaller than the content of the basic oxide when the acidic oxide is contained. COPYRIGHT : (C)2013, JPO&INPIT


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