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By atmospheric plasma particle cleaning method 发明授权

2023-06-21 3320 34K 0

专利信息

申请日期 2025-07-07 申请号 JP2008078873
公开(公告)号 JP5093670B2 公开(公告)日 2012-12-12
公开国别 JP 申请人省市代码 全国
申请人 National College Organization504237050
简介 PROBLEM TO BE SOLVED : To provide a device for removing, cleaning and recovering efficiently contaminated particles. ŽSOLUTION : A contaminated particle-rare gas stream is introduced into an atmospheric-pressure plasma space through nozzles 2a and 2b having an angle to electrodes 1a and 1b, and collided with insulators 5a and 5b installed between the electrodes or between the electrode and the nozzle to remove contaminated materials from the particle 6 surfaces, or to collide particles in an aggregational state of secondary particles and convert them into a primary particle state and remove and clean the contaminated materials of the particle surfaces. The contaminated materials of the particle surfaces are again removed and cleaned with the atmospheric-pressure plasma by the rare gas stream from the nozzle installed in the rear to improve the cleaning effects, and to efficiently recover the particles. ŽCOPYRIGHT : (C)2010, JPO&INPIT Ž


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