| 简介 |
PROBLEM TO BE SOLVED : To provide a member for a plasma treatment apparatus which is less damaged by the corrosion effect, and capable of preventing the degradation of the quality of a semi-conductor working device or any increase of the production cost caused by allowing corrosion product to serve as a cause of environmental pollution. SOLUTION : The member for the plasma treatment apparatus and its manufacturing method, wherein the adhesion and deposition characteristics of particles or the like are excellent, the re-scattering preventive characteristic is excellent, and the plasma erosion resistance is excellent by forming a spray deposit film consisting of Al2O3, Y2O3or Al2O3-Y2O3double oxide, on a surface of the member for the plasma treatment apparatus so that the film has a surface shape, wherein the average roughness Ra is 3.30-28.0 μm, and the skewness value (Rsk) is a positive value, are provided. COPYRIGHT : (C)2007, JPO&INPIT |
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