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THIN-FILM MAGNET 发明申请

2023-10-20 3870 58K 0

专利信息

申请日期 2025-07-09 申请号 JP2011103433
公开(公告)号 JP2012235003A 公开(公告)日 2012-11-29
公开国别 JP 申请人省市代码 全国
申请人 HITACHI LTD
简介 PROBLEM TO BE SOLVED : To provide a thin-film magnet capable of achieving high magnetic performance, i.e., a high maximum energy product. SOLUTION : In order to achieve the thin-film magnet having a high maximum energy product, there is provided a configuration of the thin-film magnet which is capable of achieving high magnetic anisotropic energy and high saturation magnetization. One or more metals selected from a group consisting of Ta, Nb, V, Cr, Ru, Cu, and Ag are formed directly on one surface of an Fe or FeCo film. A ferromagnetic material containing a rare earth element is formed directly on the other surface of the Fe or FeCo film. COPYRIGHT : (C)2013, JPO&INPIT


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