客服热线:18202992950

A halogen gas and its manufacturing method of treating agent harmless and method of using the same 发明授权

2023-04-30 3870 167K 0

专利信息

申请日期 2025-07-07 申请号 JP2009066179
公开(公告)号 JP5074439B2 公开(公告)日 2012-11-14
公开国别 JP 申请人省市代码 全国
申请人 DSM Ltd157119
简介 PROBLEM TO BE SOLVED : To provide a processing agent for halogenated gases that can decompose compounds containing halogens such as PFCs, HFCs, HCFCs and CFCs efficiently at a comparatively low temperature, make harmful substances formed by decomposition harmless and continuously process the halogenated compound regardless of its concentration in a gas for a long time by being combined with an apparatus for harmless disposal. SOLUTION : The processing agent for halogenated gases contains at least one compound selected from the group consisting of a chloride of an alkaline metal, a chloride of an alkaline-earth metal and a fluoride of an alkaline metal and is composed of calcium oxide or magnesium oxide prepared by baking under a nitrogen atmosphere. COPYRIGHT : (C)2009, JPO&INPIT


您还没有登录,请登录后查看下载地址


反对 0举报 0 收藏 0 打赏 0评论 0
下载排行
网站首页  |  关于我们  |  联系方式  |  使用协议  |  版权隐私  |  网站地图  |  排名推广  |  广告服务  |  积分换礼  |  网站留言  |  RSS订阅  |  违规举报  |  京ICP备2021025988号-4