| 简介 |
Provided are : a film forming method which enables the formation of a good amorphous carbon film using a power supply for a bipolar PBII device in a low vacuum; and an amorphous carbon film which is obtained by the film forming method. A method for forming an amorphous carbon film using a power supply for a bipolar PBII device in a low vacuum (at about 1, 000-30, 000 Pa), wherein a power supply-side electrode (3) that is connected to a power supply (6) for a PBII device and an earth-side electrode (4) that faces the electrode (3) are arranged within a chamber (1), a base (2) is disposed on the power supply-side electrode (3) or the earth-side electrode (4), and an amorphous carbon film is formed on the surface of the base (2) by generating plasma of a rare gas and a hydrocarbon-containing gas between the base (2) and the electrode on which the base (2) is not disposed. |
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