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Substrate processing device 发明授权

2023-10-19 4160 62K 0

专利信息

申请日期 2025-07-13 申请号 JP2007088732
公开(公告)号 JP5043487B2 公开(公告)日 2012-10-10
公开国别 JP 申请人省市代码 全国
申请人 Dainippon Screen Mfg Co Ltd207551
简介 PROBLEM TO BE SOLVED : To provide a substrate treatment device capable of treating a substrate using a dilute medical liquid of which the concentration is adjusted precisely. ŽSOLUTION : A first mixing section 14 mixes a fluoric acid undiluted solution (for example, having a concentration of 49 wt.%) supplied from a fluoric acid tank 30 and DIW supplied from a DIW supply source to generate a rare-hydrofluoric acid (for example, having a concentration of 2.3 wt.%). A second mixing section 15 mixes the rare-hydrofluoric acid generated by the first mixing section 14 with the DIW supplied from the DIW supply source to generate a rare-hydrofluoric acid (for example, having 0.11 wt.%). A third mixing section 16 mixes the rare-hydrofluoric acid generated by the second mixing section 15 with the DIW supplied from the DIW supply source to generate a rare-hydrofluoric acid (for example, having 0.005 wt.%). ŽCOPYRIGHT : (C)2009, JPO&INPIT Ž


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