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A method for attaching a fluorine containing silica film 发明授权

2023-04-03 3140 74K 0

专利信息

申请日期 2025-07-11 申请号 JP2002516822
公开(公告)号 JP5027980B2 公开(公告)日 2012-09-19
公开国别 JP 申请人省市代码 全国
申请人 ESSILOR INTERNATIONAL COMPAGNIE GENERALE D9 OPTIQUE
简介 The invention concerns a method comprising evaporating silicon and/or SiOx, wherein said evaporating is further defined as occurring in the presenceof oxygen if silicon or SiOx with x less than two is being evaporated, to form a silicon oxide film at the surface of a substrate and in bombarding said silicon film, while it is being formed, with a beam of positive ions derived from both a polyfluorocarbon compound and a rare gas. The invention is useful for producing low-index antiglare films.


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