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A method of manufacturing a thermistor thin film and the thin film thermistor 发明授权

2023-04-30 1530 77K 0

专利信息

申请日期 2025-06-24 申请号 JP2007098781
公开(公告)号 JP5029882B2 公开(公告)日 2012-09-19
公开国别 JP 申请人省市代码 全国
申请人 Mitsubishi Materials Corp6264
简介 PROBLEM TO BE SOLVED : To improve quality and reliability by preventing joint defects of an electrode while suppressing a change in resistance under a high temperature environment. ŽSOLUTION : A thin-film thermistor comprises : a silicon substrate 3, where an SiO2layer 2 is formed on the surface; a thermistor thin film 4 of which the pattern is formed on the upper surface of the SiO2layer 2; a junction layer 5 formed of a metal material except a rare metal, where the pattern of the junction layer 5 is formed on the upper surface of the SiO2layer 2; and the electrode 6 made of a rare metal, where the pattern of the electrode 6 is formed on the junction layer 5. Inside the thermistor thin film 4, there is a thin-film non-formation region 4a, where the thermistor thin film 4 is not formed. The junction layer 5 and the electrode 6 are buried in the thin-film non-formation region 4a and the side is joined to the inner surface of the thermistor thin film 4. One portion of the junction layer 5 and the electrode 6 in the thin-film non-formation region 4a is removed to adjust the value of resistance. ŽCOPYRIGHT : (C)2009, JPO&INPIT Ž


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