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SUBSTRATE PROCESSING APPARATUS WITH MECHANISM RECOVERING RARE METAL 发明申请

2023-05-17 1980 60K 0

专利信息

申请日期 2025-09-19 申请号 JP2011033113
公开(公告)号 JP2012174770A 公开(公告)日 2012-09-10
公开国别 JP 申请人省市代码 全国
申请人 AQUA SCIENCE KK
简介 PROBLEM TO BE SOLVED : To provide a substrate processing apparatus having a metal recovery mechanism which can recover rare metal with high efficiency by peeling the rare metal from a substrate provided with a rare metal layer. SOLUTION : There is provided a substrate processing apparatus 100 including a stage part F on which a substrate is mounted; a mixed phase fluid jetting part E which peels rare metal from the substrate by jetting a mixed phase fluid containing steam and water to the substrate; a chamber part I having a tank wall 171 and a discharge pipe 172 discharging a mixed phase waste; a first processing part G which has a vapor liquid separation mechanism 181 which separates the mixed phase waste sent from the discharge pipe into a liquid phase and a vapor phase; and solid liquid separation means 182 which recovers rare metal from the liquid phase separated by the vapor liquid separation mechanism 181, and recovers the rare metal present in the liquid phase in the mixed phase waste; and a second processing part H which has a cyclone type separation mechanism 191 which recovers rare metal included in the vapor phase sent from the vapor liquid separation mechanism of the first processing part, and recovers rare metal present in the vapor phase in the mixed phase waste. COPYRIGHT : (C)2012, JPO&INPIT


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