| 简介 |
PROBLEM TO BE SOLVED : To provide a corrosion resistant member, which is used in semiconductor manufacturing apparatus and flat panel display manufacturing apparatus, which has sufficient corrosion resistance (plasma resistance) to a halogen-containing corrosive gas or plasma thereof, and which undergoes minimized damages to the plasma-resistant coating and substrate even after repeated washing of the member for removing the reaction products deposited on the member surface during the plasma etching process. SOLUTION : This invention provides a corrosion resistant member to be exposed to a halogen-containing gas atmosphere or a halogen-containing gas plasma atmosphere, comprising a substrate and a plurality of layers deposited thereon including a layer of rare earth fluoride providing the outermost surface and a layer of rare earth oxide having a porosity of less than 5% underlying the rare earth fluoride layer. COPYRIGHT : (C)2007, JPO&INPIT |
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