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COMPOSITE ABRASIVE GRAIN AND METHOD FOR PRODUCING THE SAME AND POLISHING COMPOSITION USING THE SAME 发明申请

2023-05-12 2780 354K 0

专利信息

申请日期 2025-09-14 申请号 JP2011262065
公开(公告)号 JP2012135866A 公开(公告)日 2012-07-19
公开国别 JP 申请人省市代码 全国
申请人 ADMATECHS CO LTD
简介 PROBLEM TO BE SOLVED : To provide a method for producing a composite abrasive grain which achieves inexpensive, highly efficient and highly accurate polishing. SOLUTION : The method for producing the composite abrasive grain comprises : a mixing step of mixing an inorganic powder comprising inorganic particles and an organic powder comprising organic particles to obtain a mixed powder; and a heating and kneading step of kneading the mixed powder while heating the same, and the method provides the composite abrasive grain in which the inorganic particles adheres to the surfaces of the organic particles. For example, the inorganic particles are ceria particles and the organic particles are polymer particles. When the composite abrasive grain obtained by the method is used, polishing of a high polishing rate can be performed while satisfactory surface roughness equal to that obtained when an abrasive grain made of only the ceria particles is used is secured. According to the composite abrasive grain, an amount of use of the ceria particles containing a rare earth can be suppressed and cost reduction and supply stability of abrasive grains, consequently of polishing slurry and the like can be attained. COPYRIGHT : (C)2012, JPO&INPIT


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