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TREATING SOLUTION FOR FORMING FLUORIDE COATING FILM, AND METHOD FOR FORMING FLUORIDE COATING FILM 发明申请

2023-03-26 4350 473K 0

专利信息

申请日期 2025-06-28 申请号 JP2012000022
公开(公告)号 JP2012136778A 公开(公告)日 2012-07-19
公开国别 JP 申请人省市代码 全国
申请人 HITACHI CHEMICAL CO LTD
简介 PROBLEM TO BE SOLVED : To provide a treatment solution and a method for forming a fluoride coating film, by which a layer containing fluoride is formed on the surface of a magnetic body continuously at a low temperature with an appropriate film thickness to improve magnetic characteristics. SOLUTION : The treatment solution for forming a fluoride coating film is composed of : a solvent consisting mainly of alcohol; and a rare earth fluoride or an alkaline earth metal fluoride, which is dispersed in the solvent. At least one of the peaks of the solution that are detected by X-ray diffraction forms a half-value width of more than one degree. Further, an insulating film is also formed. COPYRIGHT : (C)2012, JPO&INPIT


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