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COMPOSITE ABRASIVE GRAIN AND POLISHING COMPOSITION USING THE SAME 发明申请

2023-12-13 2030 243K 0

专利信息

申请日期 2025-07-18 申请号 JP2010276367
公开(公告)号 JP2012121128A 公开(公告)日 2012-06-28
公开国别 JP 申请人省市代码 全国
申请人 ADMATECHS CO LTD; RITSUMEIKAN
简介 PROBLEM TO BE SOLVED : To provide a method for producing a composite abrasive grain which enables highly accurate and efficient polishing at a low cost. SOLUTION : The composite abrasive grain comprises inorganic particles and organic particles each having an aspheric body including a concave part with a concave surface with respect to a spherical surface and a streak part surrounding the concave part, wherein the inorganic particles adhere to the surfaces of the organic particles. For example, the inorganic particles are ceria particles. The organic particles are composite polymer particles of polyurethane and polymethyl methacrylate. When the composite abrasive grain is used, high-rate polishing can be performed while securing surface roughness which is the same as that obtained when an abrasive grain made of only the ceria particles are used. The composite abrasive grain uses less amount of ceria particles and the like containing rare earth metals, thereby achieving cost reduction and stable supply of an abrasive grain and polishing slurry and the like. COPYRIGHT : (C)2012, JPO&INPIT


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