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METHOD FOR PRODUCING SiC SINGLE CRYSTAL 发明申请

2023-06-21 2710 71K 0

专利信息

申请日期 2025-07-04 申请号 JP2010263950
公开(公告)号 JP2012111670A 公开(公告)日 2012-06-14
公开国别 JP 申请人省市代码 全国
申请人 SHINETSU CHEMICAL CO
简介 PROBLEM TO BE SOLVED : To provide a method for producing an SiC single crystal increasing C solubility in a solution to improve a growth rate of the SiC single crystal, suppressing fluctuation in a solution composition due to consumption of an SiC component associated with the growth of the single crystal, and stabilizing conditions for single crystal growth. SOLUTION : The method of producing an SiC single crystal includes : disposing an SiC seed crystal 20 at a bottom part inside a graphite crucible 10; causing a solution 30 containing Si, C and R (R is at least one selected from the rare earth elements inclusive of Sc and Y) to be present in the crucible 10; supercooling the solution 30 so as to cause the SiC single crystal to grow on the seed crystal 20; and adding powdery or granular Si and/or SiC raw material 41 to the solution 30 from above the graphite crucible 10 while keeping the growth of the SiC single crystal. COPYRIGHT : (C)2012, JPO&INPIT


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