| 简介 |
PROBLEM TO BE SOLVED : To provide a method for manufacturing a rare earth permanent magnet thin film enabling mass-production at low cost of a high performance and small micro device with high processing accuracy, using a high performance permanent magnet thin film laminated with a high melting point metal layer, such as Ta, and a R-T-B based permanent magnet.
SOLUTION : The method for manufacturing a rare earth permanent magnet thin film comprises the steps of : forming on a substrate a rare earth permanent magnet thin film having a multilayer structure including a rare earth alloy magnetic layer with thickness of 500 nm or less, and a high melting point metal layer with thickness of 50 nm or less; forming a photoresist layer on the rare earth permanent magnet thin film; patterning by exposing and developing the photoresist layer; removing the exposed rare earth permanent magnet thin film by ion milling, using the patterned photoresist layer as a mask; and removing the photoresist layer on the remaining rare earth permanent magnet thin film by oxygen plasma ashing.
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