| 简介 |
PROBLEM TO BE SOLVED : To provide a polishing composition (polishing slurry) that enables efficient and inexpensive precision polishing.
SOLUTION : The polishing composition is composed of abrasive grain and a dispersion medium for dispersing the abrasive grain, and used for polishing the material to be polished. The abrasive grain comprises a crashed particle having a volume-average particle diameter of 0.01-5 μm and composed of a crushed particle of inorganic material. The dispersion medium is an alkaline dispersion medium. The crushed particle used for the polishing composition is preferably crushed silica particle obtained by crushing quartz glass. Excellent stable polishing with small surface roughness can be performed at high polishing rate by using the polishing slurry. The polishing composition does not require rare earth or the like, thereby reducing the cost of the abrasive grain and the cost of polishing slurry.
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