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Method of producing sic single crystal 发明申请

2023-07-21 2350 361K 0

专利信息

申请日期 2025-07-08 申请号 EP11190766
公开(公告)号 EP2458039A1 公开(公告)日 2012-05-30
公开国别 EP 申请人省市代码 全国
申请人 Shin Etsu Chemical Co Ltd
简介 A method of producing a SiC single crystal includes : disposing a SiC seed crystal at a bottom part inside a graphite crucible; causing a solution containing Si, C and R (R is at least one selected from the rare earth elements inclusive of Sc and Y) or X (X is at least one selected from the group consisting of Al, Ge, Sn, and transition metals exclusive of Sc and Y) to be present in the crucible; supercooling the solution so as to cause the SiC single crystal to grow on the seed crystal; and adding powdery or granular Si and/or SiC raw material to the solution from above the graphite crucible while keeping the growth of the SiC single crystal.


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