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Al ALLOY FILM, WIRING STRUCTURE HAVING Al ALLOY FILM, AND SPUTTERING TARGET USED IN PRODUCING Al A 发明申请

2023-10-31 4480 927K 0

专利信息

申请日期 2025-06-24 申请号 JP2011127711
公开(公告)号 JP2012094485A 公开(公告)日 2012-05-17
公开国别 JP 申请人省市代码 全国
申请人 KOBE STEEL LTD
简介 PROBLEM TO BE SOLVED : To provide an Al alloy film, that, in a production process of a thin-film transistor substrate, reflective film, reflective anode electrode, touch panel sensor, or the like, can effectively prevent corrosion such as corrosion on an Al alloy surface when immersed in a sodium chloride solution and pinhole corrosion (black dots), thereby having excellent corrosion resistance, and also can prevent hillock formation, thereby also having excellent heat resistance. SOLUTION : An Al alloy thin film of the present invention is used for a wiring film or a reflective film on a substrate, and contains 0.01 to 0.5 atom% of Ta and/or Ti and 0.05 to 2.0 atom% of a rare earth element. COPYRIGHT : (C)2012, JPO&INPIT


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