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ELECTROSTATIC CHUCK AND METHOD FOR MANUFACTURING THE SAME 发明申请

2023-09-30 2380 94K 0

专利信息

申请日期 2025-06-24 申请号 JP2011189445
公开(公告)号 JP2012094826A 公开(公告)日 2012-05-17
公开国别 JP 申请人省市代码 全国
申请人 SUMITOMO OSAKA CEMENT CO LTD
简介 PROBLEM TO BE SOLVED : To provide an electrostatic chuck that is used in halogen-based corrosive gas and the plasma thereof, has a sufficient attraction force which is uniform in the plane, exhibits excellent mechanical strength, and has a low residual attraction force, and to provide a method for manufacturing the same. SOLUTION : An electrostatic chuck contains a composite oxide sintered body including an yttrium aluminum oxide crystal phase (A) or a crystal phase (B) prepared by substituting a part of yttrium in the yttrium aluminum oxide with a rare earth element other than yttrium, and a rare earth element other than yttrium-aluminum oxide crystal phase (C). A content of the crystal phase (C) calculated according to a predetermined formula based on an X-ray diffraction profile is 0.05 to 10%. A manufacturing method thereof is also provided. COPYRIGHT : (C)2012, JPO&INPIT


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