| 简介 |
PROBLEM TO BE SOLVED : To provide plane tribo-polishing method and device capable of finishing many highly vulnerable materials such as a glass substrate used for an IT liquid crystal panel, a hard disk or a frequency cut filter for an optical device, a SiC substrate which is a semiconductor substrate material for a next-generation power device, a sapphire substrate used as a LED illumination substrate, and a quartz crystal substrate of an oscillator substrate with high quality at a high speed, and suppressing the used amount of cerium oxide or the like which is a kind of rare earth.SOLUTION : A plurality of upper surface plates that automatically execute rotation movements, sliding or elliptic movements is constructed by arranging the bottom surfaces thereof flush in parallel to form an upper surface plate group. Lower surface plates are oppositely spaced from the upper surface plate group to be rotatable. While the upper surface plate group and the lower surface plate are independently rotated and an electric field is applied to the opposing intervals, an article to be processed which is held in a carrier is made to face them, and the surface of the article to be processed is polished by supplying slurries obtained by dispersing dielectric abrasive grains in water.COPYRIGHT : (C)2012, JPO&INPIT |
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