| 申请日期 | 2025-06-25 | 申请号 | TW107126570 |
| 公开（公告）号 | TW201916164A | 公开（公告）日 | 2019-04-16 |
| 公开国别 | TW | 申请人省市代码 | 全国 |
| 申请人 | 南韩商KOMICO有限公司 | ||
| 简介 | The present invention relates to a plasma etching apparatus member and a manufacturing method therefor and, more specifically, to : a plasma etching apparatus member, which improves plasma-resistant properties through deposition of rare earth metal thin film and surface heat treatment, and maintains light transmittance so as to be usable as a member for analyzing the end point of an etching process; and a manufacturing method therefor. | ||
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