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METHOD OF MANUFACTURING A SILICON CARBIDE SINGLE CRYSTAL 发明授权

2022-12-30 3050 234K 0

专利信息

申请日期 2025-06-25 申请号 EP07734322
公开(公告)号 EP2004883B1 公开(公告)日 2012-03-21
公开国别 EP 申请人省市代码 全国
申请人 Toyota Jidosha Kabushiki Kaisha
简介 Silicon raw material is filled into a graphite crucible (10), the graphite crucible (10) is heated to form molten silicon (M), at least one rare earth element and at least one of Sn, Al, and Ge are added to molten silicon (M), and a temperature gradient is maintained in the molten silicon in which the temperature decreases from within the molten silicon toward the surface while growing an silicon carbide single crystal starting from an silicon carbide seed crystal (14) held immediately below the surface of the molten liquid.


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