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Device for treating wastewater containing gallium and gallium-containing waste water treatment metho 发明授权

2023-07-27 4790 38K 0

专利信息

申请日期 2025-06-26 申请号 JP2001286497
公开(公告)号 JP4900635B2 公开(公告)日 2012-03-21
公开国别 JP 申请人省市代码 全国
申请人 KURITA WATER IND LTD
简介 PROBLEM TO BE SOLVED : To provide a treatment apparatus for gallium-containing waste water in which gallium-containing waste water discharged from a wafer manufacturing plant, a device manufacturing plant for a compound semiconductor is treated to efficiently recover gallium in high concentration, in particular, which is a rare and useful metal. SOLUTION : The treatment apparatus for the gallium-containing waste water has a solid liquid separation means for removing a suspended solid in the gallium-containing waste, a gallium adsorption means for adsorbing gallium in the treated water in the solid liquid separation means, a gallium releasing means for bringing a liquid into contact with the gallium adsorption means to release gallium adsorbed in the gallium adsorption means and a gallium concentrating means for concentrating the liquid containing the released gallium.


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