| 简介 |
An impurity removing apparatus is simple in structure for removing impurities from a rare gas and enable to make the rare gas reusable. The impurity removing apparatus includes a first treatment device 21 for removing fluorine and fluorine compound which are mixed with a rare gas discharged from an excimer laser oscillation apparatus 10, a second treatment device 23 for removing oxygen generated by the first treatment device, and a circulation device 25 for circulating the rare gas discharged from the excimer laser oscillation apparatus 10 and returning the rare gas to the excimer laser oscillation apparatus 10. |
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