| 申请日期 | 2025-07-08 | 申请号 | KR1020057017513 |
| 公开（公告）号 | KR101120150B1 | 公开（公告）日 | 2012-02-17 |
| 公开国别 | KR | 申请人省市代码 | 全国 |
| 申请人 | SIGMA ALDRICH CO | ||
| 简介 | Rare earth metal precursors, for use in MOCVD techniques have a ligand of the general formula OCR1(R2)CH2X, wherein R1 is H or an alkyl group, R2 is an optionally substituted alkyl group and X is selected from OR and NR2, wherein R is an alkyl group or a substituted alkyl group. Methods of making such precursors and methods of depositing metal oxide layers from such precursors are also described. | ||
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