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Interlayer of orientational substrate and orientational substrate for forming epitaxial film 检索报告

2023-09-01 4580 239K 0

专利信息

申请日期 2025-06-25 申请号 EP08010282
公开(公告)号 EP2000566A3 公开(公告)日 2012-01-18
公开国别 EP 申请人省市代码 全国
申请人 Chubu Electric Power Co Inc; Tanaka Kikinzoku Kogyo K K
简介 [Problem to be Solved] Provided is an interlayer of a textured substrate for forming an epitaxial film that permit the formation of an epitaxial film having a high texture. [Means for Solution] The present invention provides an interlayer of a textured substrate for forming an epitaxial film that is provided between a base material and an epitaxial film formed on at least one surface of the base material, in which the interlayer has a single layer structure or a multilayer structure of not less than two layers and a layer in contact with the substrate is formed from an indium tin oxide. This interlayer can have a multilayer structure, and can be provided on the ITO layer, with at least one layer formed from nickel, nickel oxide, zirconium oxide, a rare earth oxide, magnesium oxide, strontium titanate (STO), strontium titanate-barium (SBTO), titanium nitride, silver, palladium, gold, iridium, ruthenium, rhodium, and platinum.


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