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METHOD OF MANUFACTURING SILICON BONDING FILM, METHOD OF MANUFACTURING PACKAGE, PACKAGE, PIEZOELEC 发明申请

2023-10-31 2370 169K 0

专利信息

申请日期 2025-07-18 申请号 JP2010076345
公开(公告)号 JP2011211439A 公开(公告)日 2011-10-20
公开国别 JP 申请人省市代码 全国
申请人 SEIKO INSTR INC
简介 PROBLEM TO BE SOLVED : To provide : a method of manufacturing silicon bonding films, which prevents generation of rare gas when anode bonding is performed; a method of manufacturing packages; a package; a piezoelectric oscillator; an oscillator; an electronic device; and an electric wave clock. SOLUTION : A bonding film 23 for anodic bonding with a frame area 3c of a lid board 3 is manufactured on the surface 2b of a base board 2. The bonding film 23 is generated by a CVD method using an introducing gas not including rare gas. COPYRIGHT : (C)2012, JPO&INPIT


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