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The thin film element and its manufacturing method supermagnetostrictive 发明授权

2023-09-27 4320 92K 0

专利信息

申请日期 2025-07-08 申请号 JP2004156009
公开(公告)号 JP4771398B2 公开(公告)日 2011-09-14
公开国别 JP 申请人省市代码 全国
申请人 FDK Corporation237721; Nagano391001619; Hiroyuki young side594192202
简介 PROBLEM TO BE SOLVED : To obtain a super-magnetostrictive thin film element showing a high magnetostrictive characteristic of ≥700 ppm in a low magnetic field (80k A/m) and having low coercive force (≤8k A/m). SOLUTION : In the super-magnetostrictive thin film element constituted of forming a thin film consisting of a super-magnetostrictive material on a substrate, the thin film consists of a super-magnetostrictive material of a vapor-grown Rx(Fe1-yCoy)100-x(provided that R is a rare earth element containing Y) group, and the composition consists of an R amount x of 30≤x≤45 and a Co amount ratio y of 0.2≤y (preferably 0.3≤y≤0.9). During the formation of a thin film by vapor phase growth or after the formation of the thin film, the thin film is thermally treated at 200 to 350 °C. COPYRIGHT : (C)2006, JPO&NCIPI


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