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Vacuum evaporation source 发明申请

2023-03-03 1840 84K 0

专利信息

申请日期 2025-07-11 申请号 JP2010027282
公开(公告)号 JP2011162846A 公开(公告)日 2011-08-25
公开国别 JP 申请人省市代码 全国
申请人 MITSUBISHI HEAVY IND LTD
简介 PROBLEM TO BE SOLVED : To provide a vacuum evaporation source which allows a stable quality thin film to be deposited for a long period of time by reducing thermal deterioration in an organic material.SOLUTION : The vacuum evaporation source 11 includes an evaporation chamber 14 storing the organic material 13 and evaporating the organic material 13 and jets the evaporated organic material 13. In the vacuum evaporation source 11, the heating region of the evaporation chamber 14 is partitioned into two or more ones in a depth direction, heaters 21 to 23 are respectively arranged for each partitioned heating region, the heating region with the surface of the organic material 13 is heated at the vaporization temperature of the organic material 13 by the heater in the heating region, the heating region higher than the heating region with the surface of the organic material 13 is heated at a temperature higher than the re-sticking temperature of the organic material 13 by the heater in the heating region, and the heating region lower than the heating region with the surface of the organic material 13 is heated at a temperature lower than the vaporization temperature by the heater in the heating region.COPYRIGHT : (C)2011, JPO&INPIT


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