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Cerium abrasive material 发明授权

2023-07-28 3530 343K 0

专利信息

申请日期 2025-06-26 申请号 JP2005318988
公开(公告)号 JP4756996B2 公开(公告)日 2011-08-24
公开国别 JP 申请人省市代码 全国
申请人 Mitsui Mining amp; Smelting Co Ltd6183
简介 Disclosed is a high-purity cerium polishing agent having a high cerium oxide content, which is improved in polishing rate. Specifically disclosed is a cerium polishing agent wherein the cerium oxide content relative to the total rare earth oxide (TREO) is not less than 90% by mass. This cerium polishing agent is characterized in that at least one specific element selected from the group consisting of Ti and group 5-12 elements having an atomic number of 80 or less is contained in an amount of 0.01-2.0% by mass relative to the total mass of the polishing agent.


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