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METHOD FOR ENHANCING DENSENESS OF METAL FILM TO BE VAPOR-DEPOSITED 发明申请

2023-10-03 1520 297K 0

专利信息

申请日期 2025-07-12 申请号 JP2010018475
公开(公告)号 JP2011157572A 公开(公告)日 2011-08-18
公开国别 JP 申请人省市代码 全国
申请人 HITACHI METALS LTD
简介 PROBLEM TO BE SOLVED : To provide a method for enhancing denseness of a metal film to be vapor-deposited on an object to be processed such as rare earth-based permanent magnet.SOLUTION : A wire-like metal vapor deposition material containing vapor deposition control gas is evaporated while being continuously supplied to a melt-evaporation part heated in a vapor deposition tank, thereby a metal film is vapor-deposited on a surface of an object in a state in which the vapor deposition control gas is supplied to at least the melt-evaporation part and to a vicinity of the object in the vapor deposition tank. In this case, the vapor deposition is performed while maintaining the ratio of noble gas partial pressure to the total pressure in the vapor deposition tank at 0.2-0.8.COPYRIGHT : (C)2011, JPO&INPIT


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