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R-T-B permanent magnet 发明授权

2023-03-25 2550 76K 0

专利信息

申请日期 2025-06-28 申请号 JP2008176214
公开(公告)号 JP4730564B2 公开(公告)日 2011-07-20
公开国别 JP 申请人省市代码 全国
申请人 TDK Corporation3067
简介 PROBLEM TO BE SOLVED : To provide an R-T-B based permanent based magnet easily applicable to the actual manufacture of an R-T-B based permanent based magnet, and having an effective plating film to secure a hardness. SOLUTION : The R-T-B based permanent based magnet 1 has a magnet element 2 composed of a sintered compact including at least a main-phase crystal grain comprising an R2T14B compound, and an intergranular phase containing more R than in the main-phase crystal grain; and a plating film 3 formed by an electrolytic Cu plating method for coating the surface of the magnetic element 2, and satisfied with the following inequality 0.0052T14B compound, R is one or more kinds of rare-earth elements including Y, and T is one or more kinds of transition metals indispensable of Fe or Fe and Co. COPYRIGHT : (C)2009, JPO&INPIT


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