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Method for suppressing formation of the projections in the metal deposition film 发明授权

2023-11-27 3250 147K 0

专利信息

申请日期 2025-07-07 申请号 JP2001199749
公开(公告)号 JP4715047B2 公开(公告)日 2011-07-06
公开国别 JP 申请人省市代码 全国
申请人 Hitachi Metals Ltd5083
简介 PROBLEM TO BE SOLVED : To provide a method for effectively suppressing the generation of projections on a metal vapor-deposited film of aluminum or zinc when the film is formed on a surface of a work such as rare earth permanent magnet. SOLUTION : When a metal vapor deposition material is vapor-deposited on a surface of a work while rotating an accommodating member and/or a holding member around the axis of rotation in the horizontal direction by using a vapor deposition apparatus having a vaporization unit of the vapor deposition material and the accommodating member and/or the holding member for accommodating and/or holding the work, Vickers hardness of the film formed on the surface of the work is maintained to be >=25.


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