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Hetero junction field effect transistor and method of fabricating the same 发明授权

2023-01-22 1910 553K 0

专利信息

申请日期 2025-07-08 申请号 US12507604
公开(公告)号 US7973338B2 公开(公告)日 2011-07-05
公开国别 US 申请人省市代码 全国
申请人 Nobuaki Teraguchi
简介 There is provided a hetero junction field effect transistor including : a first layer of a nitride based, group III-V compound semiconductor; a second layer of a nitride based, group III-V compound semiconductor containing a rare earth element, overlying the first layer; a pair of third layers of a nitride based, group III-V compound semiconductor, overlying the second layer, the third layers being spaced from each other; a gate electrode disposed between the third layers at least a region of the second layer; and a source electrode overlying one of the third layers and a drain electrode overlying an other of the third layers. A method of fabricating the hetero junction field effect transistor is also provided.


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