| 简介 |
PROBLEM TO BE SOLVED : To provide a sputtering apparatus capable of depositing high-quality thin films containing no impurities, and a method of forming the high-quality thin films using the sputtering apparatus.SOLUTION : There is provided a method of manufacturing the light emitting device for depositing a semiconductor layer by using a the target material representative of a semiconductor material and the sputtering apparatus having parts covered with the thermal spraying material with the same material as the target material, and applying high-frequency power by using the target material in an atmosphere containing rare gases.COPYRIGHT : (C)2011, JPO&INPIT |
客服热线：
手机版
二维码
