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Magnetic Tunnel Junction device, method of manufacturing the same and electronic device comprising 发明申请

2023-04-04 3590 482K 0

专利信息

申请日期 2025-07-21 申请号 KR1020090125036
公开(公告)号 KR1020110068185A 公开(公告)日 2011-06-22
公开国别 KR 申请人省市代码 全国
申请人 SAMSUNG ELECTRONICS CO LTD; GWANGJU INSTITUTE OF SCIENCE AND TECHNOLOGY
简介 PURPOSE : A magnetic tunnel junction device, a method of manufacturing the same and an electronic device comprising the same are provided to have a high magnetoresistance ratio by maintaining an electronic device having a magnetic tunnel junction device amorphous state in a thermal treatment process.CONSTITUTION : In a magnetic tunnel junction device, a method of manufacturing the same and an electronic device comprising the same, a vertical MTJ(100) comprises a pinned layer(30), a tunneling film(40), and a free layer(50). The pinned layer comprises a plurality of a pair of material layers(30P1~30Pn). The first material layer comprises a first rare-earth transition metal layer(30a) and a second rare-earth transition metal layer(30b) The tunneling film is used for the coherent tunneling of a spin polarization current. The free layer has a vertical magnetic anisotropy.COPYRIGHT KIPO 2011


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