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A method of manufacturing a GaN based compound semiconductor crystal 发明授权

2023-06-06 2360 36K 0

专利信息

申请日期 2025-07-27 申请号 JP2001237976
公开(公告)号 JP4673514B2 公开(公告)日 2011-04-20
公开国别 JP 申请人省市代码 全国
申请人 JX Nippon Mining amp; Metals Co Ltd502362758
简介 PROBLEM TO BE SOLVED : To provide a technology for a method of producing a GaN-based compound semiconductor crystal using a rare earth group 13 (3B) perovskite as a substrate, which comprises improving the quality of a GaN thin film formed between the substrate and the GaN-based compound semiconductor crystal and by which the crystal quality of the GaN-based compound semiconductor crystal can be improved. SOLUTION : In a method for growing the GaN-based compound semiconductor crystal on the surface (1 main surface) of the substrate of the rare earth group 13 (3B) perovskite crystal containing one or more rare earth elements, a high quality GaN single crystal thin film having a uniform thickness is formed on the substrate of the rare earth group 13 (3B) perovskite crystal mentioned above by allowing Ga atom to adsorb on the substrate of the rare earth group 13 (3B) perovskite crystal so as to form several atomic layers and nitriding the adsorbed Ga atom, and then, the GaN-based compound semiconductor crystal is grown on the high quality GaN single crystal thin film mentioned above.


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