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2023-06-04 4260 156K 0

专利信息

申请日期 2025-07-18 申请号 JP2000108234
公开(公告)号 JP4674776B2 公开(公告)日 2011-04-20
公开国别 JP 申请人省市代码 全国
申请人 ULVAC Inc231464
简介 PROBLEM TO BE SOLVED : To provide a hydrogen treatment device for controlling a hydrogen gas not to form a mixed gas with an atmospheric air when introducing the hydrogen gas into a hydrogen treatment chamber of the hydrogen treatment device for the hydrogen treatment of a rare earth element contained magnet. SOLUTION : After an atmospheric air in the hydrogen treatment chamber 1 is substituted with an argon gas when the hydrogen gas is introduced into the hydrogen treatment chamber 1, the argon gas is evacuated to introduce the hydrogen gas. Right before the hydrogen gas is introduced, the presence or not of vacuum leak from an evacuation system containing a mechanical booster pump 75 under a high vacuum is identified, followed by stopping the vacuum pump for performing pressure rise test in the hydrogen treatment chamber 1 and vacuum leak check. The pressure rise test is judged to be acceptable or not in accordance with the result of maximum twice repeated test.


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