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The method of forming the same and thin ultrahydrophilic 发明授权

2023-09-14 4060 42K 0

专利信息

申请日期 2025-08-18 申请号 JP2004250592
公开(公告)号 JP4662122B2 公开(公告)日 2011-03-30
公开国别 JP 申请人省市代码 全国
申请人 Central Research Institute of Electric Power Industry173809
简介 PROBLEM TO BE SOLVED : To prepare a thin film capable of maintaining superhydrophilic properties over a long period without being irradiated with ultraviolet rays and also having the characteristics of being capable of easily recovering the superhydrophilic properties by ultraviolet rays, and to provide a method for foming the same. SOLUTION : In the method for forming the thin film, the grains with a grain size of 1 to 100 μm of at least one kind of oxide selected from the group consisting of transition metal oxides and rare earth element oxides are plasma-sprayed to form a superhydrophilic thin film with a thickness of 0.05 to 1 mm on a substrate, or, the grains with a grain size of 1 to 100 μm and made of at least one kind of oxide selected from the group consisting of transition metal oxides and rare earth element oxides by oxidation treatment are plasma-sprayed to form a thin film with a thickness of 0.05 to 1 mm on the substrate, and the thin film is subjected to oxidation treatment with the flame of a gas burner, so as to deposit the superhydrophilic thin film. COPYRIGHT : (C)2006, JPO&NCIPI


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