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SPUTTERING TARGET FOR REFLECTION LAYER OF OPTICAL MEDIUM, AND METHOD FOR MANUFACTURING THE SAME 发明申请

2023-05-28 4750 155K 0

专利信息

申请日期 2025-07-07 申请号 JP2010216557
公开(公告)号 JP2011044225A 公开(公告)日 2011-03-03
公开国别 JP 申请人省市代码 全国
申请人 TDK CORP
简介 PROBLEM TO BE SOLVED : To provide a sputtering target for a reflection layer of an optical medium excellent in surface smoothness which is composed mostly of relatively inexpensive aluminum and does not use rare earth metal, and a method for manufacturing thereof. SOLUTION : The sputtering target for a reflection layer of an optical medium is mainly composed of Al and contains 1-10 at% of one or two species of elements selected from the group consisting of Ta and Nb, and 0.1-10 at% of Ag. The method for manufacturing the sputtering target for a reflection layer of an optical medium includes a process for firing raw material powder having a composition that is mainly composed of Al and contains 1-10 at% of one or two species of elements selected from the group consisting of Ta and Nb, and 0.1-10 at% of Ag. COPYRIGHT : (C)2011, JPO&INPIT


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