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Composition for thin film capacitive element, an insulating film having a high dielectric constant, 发明授权

2023-05-02 3030 129K 0

专利信息

申请日期 2025-07-08 申请号 JP2006512633
公开(公告)号 JP4623005B2 公开(公告)日 2011-02-02
公开国别 JP 申请人省市代码 全国
申请人 TDK Corporation3067
简介 A thin film capacitor element composition having a bismuth layered compound with a c-axis oriented substantially vertical to the substrate surface, wherein the bismuth layered compound is expressed by the formula (Bi2O2)2+(Am-1BmO3m+1)2- or Bi2Am-1BmO3M+3, the symbol m in the formula is an odd number, at least part of the Bi and/or A of the bismuth layered compound is substituted by a rare earth element, and the number of moles substituted by the rare earth element is larger than 1.0 and 2.8 or less with respect to the number of moles (m+1) of the total of Bi and A.


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