| 简介 |
The present invention relates to a member for a plasma etching device and a manufacturing method and, more specifically, to a plasma etching device which improves plasma resistance through the deposition of a rare-earth metal thin film and surface heat treatment, and can be used a member for analyzing an end point of an etching process while maintaining optical transparency; and to a manufacturing method of the member for a plasma etching device.(AA) Rare-earth metal thin film(BB) Quartz member(CC) Heat treatmentCOPYRIGHT KIPO 2019 |
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