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The raw material for chemical vapor deposition and metal compound 发明授权

2023-09-22 4040 98K 0

专利信息

申请日期 2025-07-01 申请号 JP2001115368
公开(公告)号 JP4618927B2 公开(公告)日 2011-01-26
公开国别 JP 申请人省市代码 全国
申请人 ADEKA Ltd387
简介 PROBLEM TO BE SOLVED : To provide a raw material for chemical vapor deposition(CVD), which is used for manufacturing a functional ceramic containing a rare earth element and a metallic compound of a rare earth element, and the metallic compound using the same. SOLUTION : The raw material for chemical vapor deposition contains a metallic compound expressed by formula (1). (In the formula, M represents the rare earth element and one of R1 and R2 represents a 1-8C alkyl group and another one of R1 and R2 represents a 6-10C alkyl group, in which 1-3 oxygen atoms can be contained).


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