| 申请日期 | 2025-07-17 | 申请号 | WOKR18008074 |
| 公开（公告）号 | WO2019054617A1 | 公开（公告）日 | 2019-03-21 |
| 公开国别 | WO | 申请人省市代码 | 全国 |
| 申请人 | KOMICO LTD | ||
| 简介 | The present invention relates to a plasma etching apparatus member and a manufacturing method therefor and, more specifically, to : a plasma etching apparatus member, which improves plasma-resistant properties through deposition of rare earth metal thin film and surface heat treatment, and maintains light transmittance so as to be usable as a member for analyzing the end point of an etching process; and a manufacturing method therefor. | ||
|
您还没有登录，请登录后查看下载地址
|
客服热线：
手机版
二维码
